Hintergrund-oben
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Laboratory for Preparation and Characterization of Nanostructures

Spectroscopy

XPS (X-Ray Photoelectron Spectroscopy)
UPS (Ultraviolet Photoelectron Spectroscopy)
AES (Auger Electron Spectroscopy)
ISS (Ion Scattering Spectroscopy)
Depth profiling (ARXPS, sputtering)

Microscopy

SEM (Scanning Electron Microscopy)
SAM (Scanning Auger Microscopy)
STM (Scanning Tunneling Microscopy)

Preparation

PVD (Physical Vapor Deposition)
CVD (Chemical Vapor Deposition)
Low Energy Electron Irradiation
Sample heating/cooling
Sputtering

Cleanroom

Whiteroom (Class 1000)

Wetbench
Optical Microscopes
Spin Coater
Photolithography

Greyroom

Optical Microscopes
Critical Point Dryer
Ozone Cleaner
Contact Angle Measurement System

Helium Ion Microscope


Helium Ion Microscope Orion from Zeiss
ELPHY MultiBeam Pattern Generator from Raith (Opens external link in new windowlink to product)

LEEPS Microscopes

Low Energy Electron Point Source (LEEPS) microscope
Nanomanipulator
Single nanowire experiments

Low Energy Electron Point Source (LEEPS) microscope
High resolution detector
Electron Holography

Scanning Probe Microscope

AFM (Atomic Force Microscopy)
STM (Scanning Tunneling Microscopy)
Electrochemistry

Infrared Spectroscopy

IRRAS (Infrared Reflection Absorption Spectroscopy)
ATR-IR (Attenuated Total Reflection Spectroscopy)

Projection Lithography

Low Energy Electron Irradiation

Ionbeam

Ion-Source (15kV)
Duo-Plasmatron Ion-Source (30kV)
Space-/Timeresolved Fragment-Spectrometer



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  • | Letzte Änderung: 11.01.2019
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